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Hlavní stránka>BS ISO 14237:2010 Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials
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sklademVydáno: 2010-08-31
BS ISO 14237:2010 Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials

BS ISO 14237:2010

Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials

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Označení normy:BS ISO 14237:2010
Počet stran:30
Vydáno:2010-08-31
ISBN:978 0 580 57402 3
Status:Standard
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BS ISO 14237:2010


This standard BS ISO 14237:2010 Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials is classified in these ICS categories:
  • 71.040.40 Chemical analysis

This International Standard specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 × 1016 atoms/cm3 to 1 × 1020 atoms/cm3.


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