BS ISO 14706:2014

This standard BS ISO 14706:2014 Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy is classified in these ICS categories:

• 71.040.40 Chemical analysis

This International Standard specifies a TXRF method for the measurement of the atomic surface density of elemental contamination on chemomechanically polished or epitaxial silicon wafer surfaces.

The method is applicable to the following:

• elements of atomic number from 16 (S) to 92 (U);

• contamination elements with atomic surface densities from 1 × 10¹⁰ atoms/cm² to 1 × 10¹⁴ atoms/cm²;

• contamination elements with atomic surface densities from 5 × 10⁸ atoms/cm² to 5 × 10¹² atoms/cm² using a VPD (vapour-phase decomposition) specimen preparation method (see 3.4).