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Homepage>BS IEC 63229:2021 Semiconductor devices. Classification of defects in gallium nitride epitaxial film on silicon carbide substrate
sklademVydáno: 2023-08-31
BS IEC 63229:2021 Semiconductor devices. Classification of defects in gallium nitride epitaxial film on silicon carbide substrate

BS IEC 63229:2021

Semiconductor devices. Classification of defects in gallium nitride epitaxial film on silicon carbide substrate

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Označení normy:BS IEC 63229:2021
Počet stran:24
Vydáno:2023-08-31
ISBN:978 0 539 02920 8
Status:Standard
DESCRIPTION

BS IEC 63229:2021


This standard BS IEC 63229:2021 Semiconductor devices. Classification of defects in gallium nitride epitaxial film on silicon carbide substrate is classified in these ICS categories:
  • 31.080.01 Semiconductor devices in general
  • 31.080 Semiconductor devices
  • 31.080.99 Other semiconductor devices
IEC 63229:2021(E) gives guidelines for the definition and classification of defects in GaN epitaxial film grown on SiC substrate. They are identified and described on the basis of examples, mainly by schematic illustrations, optical microscope images, and transmission electron microscope images for these defects. This document covers only defects in as-grown GaN epitaxial film on SiC substrate and does not include defects caused by subsequent processes.