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sklademVydáno: 2022-03-31
BS ISO 17109:2022
Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin films
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| Označení normy: | BS ISO 17109:2022 |
| Počet stran: | 32 |
| Vydáno: | 2022-03-31 |
| ISBN: | 978 0 539 19125 7 |
| Status: | Standard |
DESCRIPTION
BS ISO 17109:2022
This standard BS ISO 17109:2022 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin films is classified in these ICS categories:
- 71.040.40 Chemical analysis