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Homepage>BS ISO 23170:2022 Surface chemical analysis. Depth profiling. Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
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sklademVydáno: 2022-08-03
BS ISO 23170:2022 Surface chemical analysis. Depth profiling. Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

BS ISO 23170:2022

Surface chemical analysis. Depth profiling. Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

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Označení normy:BS ISO 23170:2022
Počet stran:38
Vydáno:2022-08-03
ISBN:978 0 539 14473 4
Status:Standard
DESCRIPTION

BS ISO 23170:2022


This standard BS ISO 23170:2022 Surface chemical analysis. Depth profiling. Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering is classified in these ICS categories:
  • 71.040.40 Chemical analysis

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