Menu
0
Total price
0 €
PRICES include / exclude VAT
Homepage>IEC 62418:2010 - Semiconductor devices - Metallization stress void test
sklademVydáno: 2010-04-22
IEC 62418:2010 - Semiconductor devices - Metallization stress void test

IEC 62418:2010

Semiconductor devices - Metallization stress void test

Dispositifs à semiconducteurs - Essai sur les cavités dues aux contraintes de la métallisation

Format
Availability
Price and currency
Anglicky/Francouzsky Hardcopy
skladem
129.62 €
Anglicky/Francouzsky PDF
Immediate download
129.62 €
Označení normy:IEC 62418:2010
Vydáno:2010-04-22
Jazyk:Anglicky/Francouzsky
DESCRIPTION

IEC 62418:2010

IEC 62418:2010 describes a method of metallization stress void test and associated criteria. It is applicable to aluminium (Al) or copper (Cu) metallization.